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K

Kenichiro Mizohata

university of helsinki

34H指数
231论文数
3.3K被引数
收录论文 106
发表时间
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Atomistic modelling and experimental study of microstructural evolution in nanocrystalline iron subjected to irradiation辐照作用下纳米晶铁微观结构演化的原子模拟与实验研究
errJournal of Nuclear Materials
IF3.2
err2026-09-14
err0
errOAAI
errIvan Tolkachev; Daniel R. Mason; Max Boleininger; Pui-Wai Ma; Daniel J. Long; Eamonn T. Connolly; Stephen P. Thompson; Kenichiro Mizohata; Felix Hofmann
err分享
err收藏
Complex He diffusion pathways induced by elemental diversity in refractory high entropy alloy MoNbTaVW难熔高熵合金MoNbTaVW中由元素多样性诱导的复杂He扩散路径
errActa Materialia
IF9.3
err2026-09-01
err0
PREAI
errChen, Zhehao; Wei, Guanying; Mizohata, Kenichiro; Lu, Eryang; Byggmastar, Jesper; Wei, Guo; An, Xudong; Perriere, Loic; Couzinie, Jean-Philippe; Huang, Zhi-Wei; Tsai, Che-Wei; Yeh, Jien-Wei; Nordlund, Kai; Djurabekova, Flyura; Tuomisto, Filip
err分享
err收藏
Atomic Layer Deposition of Metallic Molybdenum Dioxide Thin Films Enabling High-k Rutile Capacitors (Adv. Mater. Interfaces 14/2026)原子层沉积法制备金属二氧化钼薄膜，实现高介电常数金红石电容器 (Adv. Mater. Interfaces 14/2026)
errAdvanced Materials Interfaces
IF4.4
err2026-08-18
err0
errOAAI
errAlexey Ganzhinov; Miika Mattinen; Marko Vehkamäki; Kenichiro Mizohata; Mykhailo Chundak; Georgi Popov; Paavo Porri; Mikko Ritala; Matti Putkonen
err分享
err收藏
Atomic layer deposition of SnO2 thin films using tin(IV) acetate as a novel precursor使用醋酸锡(IV)作为新型前驱体进行SnO2薄膜的原子层沉积
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errDeb, Anjan; Mattinen, Miika; Heikkila, Mikko J.; Chundak, Mykhailo; Vihervaara, Anton; Mizohata, Kenichiro; Ritala, Mikko; Putkonen, Matti
err分享
err收藏
Atomic Layer Deposition of Metallic Molybdenum Dioxide Thin Films Enabling High-k Rutile Capacitors金属二氧化钼薄膜的原子层沉积技术实现高介电常数金红石电容器
errAdvanced Materials Interfaces
IF4.4
err2026-04-01
err0
errOAAI
errGanzhinov, Alexey; Mattinen, Miika; Vehkamaki, Marko; Mizohata, Kenichiro; Chundak, Mykhailo; Popov, Georgi; Porri, Paavo; Ritala, Mikko; Putkonen, Matti
err分享
err收藏
Atomic Layer Deposition of Gallium Oxide using Gallium Triazenide and Water
errmater. adv.
IF0
err2026-02-03
err0
errOAAI
errProsper Simbarashe Mushore; Pamburayi Mpofu; Kenichiro Mizohata; Kostas Sarakinos; Nathan J. O'Brien; Henrik Pedersen
err分享
err收藏
Influence of ion energy on hydrogen-induced defect stabilization of vacancies in tungsten
errJournal of Nuclear Materials
IF3.2
err2026-01-29
err0
errOAAI
errTomi Vuoriheimo; Fredric Granberg; Kenichiro Mizohata; Kalle Heinola
err分享
err收藏
Point defects in proton-irradiated highly Ga- and B-doped Ge高Ga和B掺杂Ge中质子辐照产生的点缺陷
errJournal of Applied Physics
IF2.5
err2026-01-07
err0
errOAAI
errAmoroso, Pejk; Slotte, Jonatan; Subramanian, Aravind; Sars, Waldemar; Mizohata, Kenichiro; Sumathi, R. Radhakrishnan; Tuomisto, Filip
err分享
err收藏
Spin-doping and diamagnetic-paramagnetic interplay in single crystal β-Ga2O3旋涂掺杂及反铁磁-顺磁相互作用在单晶β-Ga2O3中
errMATERIALS RESEARCH EXPRESS
IF2.2
err2025-12-01
err0
PREAI
errTuboltsev, Vladimir; Savin, Alexander; Mizohata, Kenichiro; Zhelezova, Iuliia; Tuomisto, Filip
err分享
err收藏
On the reliability of Vegard's law in compositional analysis of chemical vapor deposited AlxTi1-xN关于Vegard's law在化学气相沉积AlxTi1-xN组分分析中的可靠性
errSurface and Coatings Technology
IF6.1
err2025-11-05
err0
errOAAI
errPamburayi Mpofu; Tommy Larsson; Oscar Alm; Jonas Lauridsen; Kenichiro Mizohata; Ben F. Spencer; Hans Högberg; Kostas Sarakinos; Henrik Pedersen
err分享
err收藏
Sensitivity of soil organic carbon stabilization indicators to 24 years of land-use change across soil depth土壤有机碳稳定化指标对24年间土地利用变化在土壤深度的敏感性
errGeoderma
IF6.6
err2025-11-03
err0
errOAAI
errEva Kanari; Kristiina Karhu; Anna-Reetta Salonen; Riitta Lemola; Helena Soinne; Pierre Barré; François Baudin; Kenichiro Mizohata; Markku Oinonen; Jenie Gil; Lukas Kohl; Taina Pennanen; Chao Liang; Jussi Heinonsalo
err分享
err收藏
Chronological horizon of Weichselian submoraine organic formation and macrofossil finds with radiocarbon and tree-ring 518O analyses威斯康星期亚终碛有机沉积层的年代地层界线及宏观化石发现，结合了放射性碳定年和树木年轮δ¹⁸O分析。
errQUATERNARY GEOCHRONOLOGY
IF2.5
err2025-11-01
err0
errOAAI
errOinonen, Markku; Arppe, Laura; Uusitalo, Joonas; Helama, Samuli; Nojd, Pekka; Makinen, Harri; Saranpaa, Pekka; Mizohata, Kenichiro
err分享
err收藏
Atomic Layer Deposition of AgX (X = Cl, Br, I) Thin FilmsAgX (X = Cl，Br，I) 薄膜的原子层沉积
errACS OMEGA
IF4.3
err2025-11-01
err0
PREAI
errHeidari, Aida; Popov, Georgi; Hatanpaa, Timo; Weiss, Alexander; Chundak, Mykhailo; Mizohata, Kenichiro; Ritala, Mikko; Kemell, Marianna
err分享
err收藏
Pinacolborane as a Reducing Agent in the Atomic Layer Deposition of Copper and Bismuth三乙二醇硼烷作为铜和铋原子层沉积中的还原剂
errACS Omega
IF4.3
err2025-10-26
err0
errOAAI
errAnton Vihervaara; Timo Hatanpää; Kenichiro Mizohata; Mykhailo Chundak; Mikko Ritala
err分享
err收藏
Formation of coherent nanocomposite structure in nickel-aluminum alloys synthesized far from equilibrium在远离平衡态条件下合成的镍-铝合金中形成相干纳米复合材料结构
errActa Materialia
IF9.3
err2025-10-25
err0
errOAAI
errZhehao Chen; Aslak J.J. Fellman; Katarzyna Mulewska; Kenichiro Mizohata; Davide Gambino; Yanling Ge; Eryang Lu; Flyura Djurabekova; Andreas Delimitis; Lukasz Kurpaska; Filip Tuomisto; Kostas Sarakinos
err分享
err收藏
Atomic layer deposition of nickel sulfide thin films and their thermal and electrochemical stability硫化镍薄膜的原子层沉积及其热稳定性和电化学稳定性
errJ. Mater. Chem. A
IF9.5
err2025-08-05
err0
errOAAI
errMiika Mattinen; Johanna Schröder ‡; Timo Hatanpää; Georgi Popov; Kenichiro Mizohata; Markku Leskelä; Thomas F. Jaramillo; Michaela Burke Stevens; Stacey F. Bent; Mikko Ritala
err分享
err收藏
Effect of lithium diffusion into Ga2O3 thin films锂扩散对Ga2O3薄膜的影响
errApplied Surface Science
IF6.9
err2025-07-04
err0
errOAAI
errA. Sacchi; M. Sidoli; A. Ardenghi; O. Bierwagen; J. Kler; A. Falkenstein; R.A. De Souza; M. Martin; D. Spallek; J. Lähnemann; H. Tornatzky; M.R. Wagner; A. Parisini; M. Pavesi; M. Bosi; L. Seravalli; J.B. Varley; G. Spaggiari; D. Bersani; K. Mizohata; F. Tuomisto; G. Magnani; D. Pontiroli; M. Riccò; F. Mezzadri; S. Pasini; A. Bosio; R. Fornari; P. Mazzolini
err分享
err收藏
Vapor- and impurity-controlled growth regimes during deposition of thin noble metal films on weakly-interacting substrates在弱相互作用基底上沉积薄贵金属薄膜过程中的蒸汽和杂质控制生长阶段
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2025-06-01
err0
errOAAI
errSarakinos, K.; Kirjonen, S.; Sanzone, B.; Adjim, F. L. Nadji; Ashraf, A.; Tanzum, N. J.; Moraes, S.; Korkos, S.; Mizohata, K.
err分享
err收藏
Selective gas phase pulsed etching of oxides with NbCl5用NbCl5对氧化物进行选择性气相脉冲蚀刻
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2025-01-01
err0
errOAAI
errOjala, Juha; Vehkamaeki, Marko; Chundak, Mykhailo; Vihervaara, Anton; Mizohata, Kenichiro; Ritala, Mikko
err分享
err收藏
Enhanced migration of mono-vacancies in AlxFeCoCrNi high entropy alloysAlxFeCoCrNi高熵合金中单空位迁移的增强
errJOURNAL OF ALLOYS AND COMPOUNDS
IF6.3
err2025-01-01
err0
errOAAI
errAn, Xudong; Lu, Eryang; Makkonen, Ilja; Byggmastar, Jesper; Wei, Guanying; Zhu, Jiulong; Mizohata, Kenichiro; Chen, Zhehao; Djurabekova, Flyura; Hu, Wangyu; Deng, Huiqiu; Yang, Tengfei; Tuomisto, Filip
err分享
err收藏

研究方向

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合作学者
合作期刊
A
A. Stohl
H 指数: 118 · 论文数: 935
T
Thomas F. Jaramillo
H 指数: 111 · 论文数: 583
R
Roland A. Fischer
H 指数: 110 · 论文数: 1.4K
G
G. Eckerlin
H 指数: 107 · 论文数: 1.1K
H
Hélder A. Santos
H 指数: 96 · 论文数: 632
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